中国发明专利：一种淡色透明耐高温体式追溯聚酰亚胺薄膜材料极端制备要津美女教师
发明（算计打算）东说念主：韦嘉，俞燕蕾，兰中旭
肯求东说念主：复旦大学
专利号：ZL 201910038132.6
纲领：
本发明提供了一种淡色透明耐高温体式追溯聚酰亚胺薄膜材料极端制备要津，该类聚酰亚胺薄膜材料不仅具有优异的耐高温体式追溯性能（320℃<Tg<380℃），同期在可见光鸿沟内具有细腻的透光率，况兼情态较浅（截至波所长于310 nm~336 nm），有望扫尾在柔性光电器件基板材料及高温体式追溯材料鸿沟的期骗。其制备历程为：在氮气保护下，将含有三氟甲基结构的二胺单体、二酐单体及带有氨基基团的笼型聚倍半硅氧烷以一定比例融解于有机溶剂中，降温至‑10℃~0℃，搅动一段本领后取得聚酰胺酸先行者体溶液，再将该先行者体溶液在玻璃基板上涂膜，经过热亚胺化，最终取得淡色透明耐高温体式追溯聚酰亚胺薄膜。
Abstract：
The invention provides a light-color transparent and high-temperature-resistant shape memory polyimide film material and a preparation method thereof. The polyimide film material not only has excellent high-temperature-resistant shape memory performance (320 DEG C<Tg<380 DEG C)， but also has good light transmittance in the visible light range， and the color is light (cutoff wavelength is at 310 nm~ 336 nm)， which is expected to be applied in the field of flexible optoelectronic device substrate materials and high-temperature shape memory materials. The preparation method includes: dissolving diamine monomers containing a trifluoromethyl structure， dianhydride monomers and polyhedral oligomeric silsesquioxane with amino groups into an organic solvent under nitrogen protection according to a certain proportion， cooling to minus 10 DEG C to 0 DEG C， stirring for a certain time period to obtain a polyamide acid precursor solution， coating a glass substrate with the polyamide acid precursor solution， and performing thermal imidization to obtain the light-color transparent and high-temperature-resistant shape memory polyimide film.
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